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Exploradores botanicos europeos en Venezuela durante el siglo XIXTEXERA ARNAL, Y.Quipu. 1987, Vol 4, Num 2, pp 185-211, issn 0185-5093Article

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La Biologia en un contexto periférico. La Escuela de Biologia de la Universidad Central de VenezuelaTEXERA ARNAL, Y.Quipu. 1986, Vol 3, Num 1, pp 29-52, issn 0185-5093Article

DEVELOPMENT OF AN ION SOURCE FOR SPACELABPOMATHIOD L; HENRY D; ARNAL Y et al.1980; SPACE SCI. INSTRUMENT.; NLD; DA. 1980; VOL. 5; NO 2; PP. 197-207; BIBL. 7 REF.Article

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Influence of the multipolar magnetic field configuration on the density of distributed electron cyclotron resonance plasmasLAGARDE, T; PELLETIER, J; ARNAL, Y et al.Plasma sources science & technology (Print). 1997, Vol 6, Num 1, pp 53-60, issn 0963-0252Article

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PECVD and PIID processing of diamondlike carbonTHIERY, F; VALLEE, C; ARNAL, Y et al.Surface & coatings technology. 2004, Vol 186, Num 1-2, pp 146-152, issn 0257-8972, 7 p.Conference Paper

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New trends in PBII technology : industrial perspectives and limitationsPELLETIER, J; LE COEUR, F; ARNAL, Y et al.Surface & coatings technology. 2001, Vol 136, Num 1-3, pp 7-15, issn 0257-8972Conference Paper

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Recent developments in DECR plasmasLAGARDE, T; PELLETIER, J; ARNAL, Y et al.Journal de physique. IV. 1998, Vol 8, Num 7, pp 121-132, issn 1155-4339Conference Paper

Multipolar magnetic field structures for the scaling-up of high density plasmas excited in the d.c. to microwae frequency range and applicable to sputtering and chemical processingPELLETIER, J; LAGARDE, T; ARNAL, Y et al.Surface & coatings technology. 1995, Vol 76-77, Num 1-3, pp 770-775, issn 0257-8972, 2Conference Paper

Anisotropic development of polymers in reactive plasmas : ion energy and temperature effectsPONS, M; PELLETIER, J; JOUBERT, O et al.Le Vide, les couches minces. 1991, Vol 47, Num 256, pp 88-90, issn 0223-4335, SUPConference Paper

Low-temperature SF₆ plasma etching of Si : experimental and simulation aspectsPELLETIER, J; GERODOLLE, A; DROUOT, S et al.Le Vide, les couches minces. 1991, Vol 47, Num 256, pp 41-43, issn 0223-4335, SUPConference Paper

Anisotropic etching of silicon using an SF₆/Ar microwave multipolar plasmaPOMOT, C; MAHI, B; PETIT, B et al.Journal of vacuum science and technology. B. Microelectronics processing and phenomena. 1986, Vol 4, Num 1, pp 1-5, issn 0734-211XArticle

ENSEMBLE AUTOMATIQUE DE COMMANDE ET CONTROLE POUR UN CAISSON A PLASMA. CAHIER DES CONDITIONS ET SPECIFICATIONS TECHNIQUESSTOREY LRO; ILLIANO JM; ARNAL Y et al.1972; GR. RECH. IONOSPH., N.T.P.; FR.; DA. 1972; NO 102; PP. 1-23; H.T. 3Serial Issue